Characterizing THz Scattering Loss in Nano-Scale SOI Waveguides Exhibiting Stochastic Surface Roughness with Exponential Autocorrelation

Electromagnetic (EM) scattering may be a significant source of degradation in signal and power integrity high-contrast silicon-on-insulator (SOI) nano-scale interconnects, such as opto-electronic or optical interconnects operating at 100 s THz where two-dimensional (2D) analytical models dielectric slab waveguides are often used to approximate loss. In this work, formulation is presented relate the (propagation) loss parameters (S-parameters) for smooth waveguide; results correlated with from finite-difference time-domain (FDTD) method 2D space. We propose normalization factor previous stochastic based on physical exhibiting random surface roughness under exponential autocorrelation function (ACF), validate by comparing against numerical experiments via FDTD method, through simulation hundreds rough waveguides; additionally, compared other 3D experimental results. The environment described validated waveguide solutions wave impedance, propagation constant, S-parameters. Results show that model agreement solution reasonable approximation waveguide.